Target material.

专利名称：Target material.

发明人：Cheng, Yuanda R,Kennedy, Steven

Roger,Racine, Michael Gene

申请号：EP052682.7申请日：20050727公开号：EP1637625A3公开日：20060705

摘要：A sputter target composed of a ferromagnetic alloy having a base metal, and X,where X is a metal having an atomic diameter of less than 0.266 nm and an oxidationpotential greater than the base metal. The base metal may be Fe, Co, or any otherferromagnetic material, and may be further comprised of elements such as Pt, Ta and/orCr to enhance its coercivity. X may be a metal selected from the group consisting of Al,Ba, Be, Ca, Cd, Ce, Cr, Cs, Dy, Er, Eu, Ga, Gd, Hf, Ho, K, La, Li, Mg, Mn, Na, Nb, Nd, Pm, Pr, Rb,Sc, Sm, Sr, Ta, Tb, Te, Th, Ti, V, Y, Zn, and Zr. The sputter target may comprise more than 0less than 15 atomic percent X. The sputter target is reactively sputtered to form agranular medium with optimized magnetic grain size and grain-to-grain separation.

申请人：Heraeus, Inc.

地址：301 North Roosevelt Avenue Chandler, AZ 85226 US

国籍：US

代理机构：Hill, Justin John

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