Reticulated refractory metal structure and method

专利名称：Reticulated refractory metal structure and

method for making

发明人：Harney, Marilyn J.,Sane, Ajit Y.,Vauss, Elvin M.,

Jr.

申请号：EP83810312申请日：19830708公开号：EP0099337A3公开日：19860205

专利附图：

摘要：A self-supporting reticulate of titanium hydride (TiH) is formed by slurry-coating an open cell organic synthetic resinous material, or other pore-former, and

eliminating the carbon-containing components of binder and/or solvent, viscositymodifiers, thickening agents, and the like at a temperature below about 400°C. In ananalogous manner, an inorganic refractory material open cell substrate or other pore-former substrate may be slurry-coated and converted to a TiH reticulate in which thesubstrate is coated with TiH to yield a supported TiH reticulate. Either the self-supporting TiH reticulate, or the supported one, free of carbonaceous material, may besintered to yield an essentially pure Ti (metal) reticulate which is essentially free oftitanium carbide. Ti reticulates so formed are coated with Pt group metal oxides and usedas anodes in chloralkali cells.

申请人：ELTECH SYSTEMS LIMITED

代理人：Cronin, Brian Harold John

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